circuit

An experiment on integrated circuits was reported by Phadke et al.
(1983). The width of lines made by a photoresist-nanoline tool were
measured in five different locations on silicon wafers, measurements being
taken before and after an etching process being treated separately.
Here, the pre-etching data are analyzed. The eight experimental factors
(A-H) were arranged in an L18 orthogonal array and produced 33
measurements at each of five locations, giving a total of 165 observations.
There were no whole-plot (i.e. between-wafer) factors.

Allows various models for multivariate response variables where each response is assumed to follow double hierarchical generalized linear models. In double hierarchical generalized linear models, the mean, dispersion parameters for variance of random effects, and residual variance can be further modeled as random-effect models.

Maengseok Noh

mdhglm

Multivariate Double Hierarchical Generalized Linear Models

circuit function

A data frame with 165 observations on the following 13 variables.<dl class="dl-horizontal">
 <dt><code>Width</code></dt><dd>width of lines made by a photoresist-nanoline tool</dd>
 <dt><code>A</code></dt><dd>a factor A with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>B</code></dt><dd>a factor B with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>C</code></dt><dd>a factor C with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>D</code></dt><dd>a factor D with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>E</code></dt><dd>a factor E with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>F</code></dt><dd>a factor F with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>G</code></dt><dd>a factor G with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>H</code></dt><dd>a factor H with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>I</code></dt><dd>a factor I with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>Wafer</code></dt><dd>wafers indenfifier</dd>
 <dt><code>waf</code></dt><dd>replication number for two replicates</dd>
 <dt><code>exp</code></dt><dd>experiment number for differenct array</dd>
 </dl>

Format

Integrated Circuit Data — circuit

A data frame with 165 observations on the following 13 variables.<dl class='dl-horizontal'>
 <dt><code>Width</code></dt><dd>width of lines made by a photoresist-nanoline tool</dd>
 <dt><code>A</code></dt><dd>a factor A with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>B</code></dt><dd>a factor B with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>C</code></dt><dd>a factor C with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>D</code></dt><dd>a factor D with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>E</code></dt><dd>a factor E with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>F</code></dt><dd>a factor F with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>G</code></dt><dd>a factor G with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>H</code></dt><dd>a factor H with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>I</code></dt><dd>a factor I with levels <code>1</code>, <code>2</code> and <code>3</code></dd>
 <dt><code>Wafer</code></dt><dd>wafers indenfifier</dd>
 <dt><code>waf</code></dt><dd>replication number for two replicates</dd>
 <dt><code>exp</code></dt><dd>experiment number for differenct array</dd>
 </dl>

circuit: Integrated Circuit Data

Description

Usage

Arguments

Format

References