ETCHRATE

Rate of removal of field oxide in a semiconductor plasma etching process.

datasets

This R package is providing all the data sets and statistical analysis applications used in Modern Industrial Statistics, with applications using R, MINITAB and JMP by R.S. Kenett and S. Zacks with contributions by D. Amberti, John Wiley and Sons, 2013, which is a second revised and expanded revision of Modern Industrial Statistics: Design and Control of Quality and Reliability, R. Kenett and S. Zacks, Duxbury/Wadsworth Publishing, 1998.

Daniele Amberti

ETCHRATE: Data on the Rate of Etching

Description

Usage

Arguments

source

Examples