mistat (version 0.999)

ETCHRATETWO: Data on the Rate of Etching (two samples)

Description

Rate of removal of field oxide in two different semiconductor plasma etching processes, A and B.

Usage

data(ETCHRATETWO)

source

Digital Equipment Corporation (1988).

Examples

data(ETCHRATETWO)

boxplot(values ~ ind, data=stack(ETCHRATETWO))