ETCHRATETWO


Rate of removal of field oxide in two different semiconductor plasma etching processes, A and B.


datasets

This R package is providing all the data sets and statistical analysis applications used in "Modern Industrial Statistics: with applications in R, MINITAB and JMP" by R.S. Kenett and S. Zacks with contributions by D. Amberti, John Wiley and Sons, 2013, which is a second revised and expanded revision of "Modern Industrial Statistics: Design and Control of Quality and Reliability", R. Kenett and S. Zacks, Duxbury/Wadsworth Publishing, 1998.

Daniele Amberti

mistat

Data Sets, Functions and Examples from the Book: "Modern
Industrial Statistics" by Kenett, Zacks and Amberti

ETCHRATETWO function

A data frame with 12 observations on the following 2 variables.
  <dl>
    <dt><code>A</code></dt><dd>a numeric vector, rate of etching, sample A</dd> <dt><code>B</code></dt><dd>a numeric vector, rate of etching, sample B</dd> </dl> 

ETCHRATETWO: Data on the Rate of Etching (two samples)

Description

Usage

Arguments

Format

Source

Examples