ETCHRATE

<p>Rate of removal of field oxide in a semiconductor plasma etching process.</p>

datasets

Provide all the data sets and statistical analysis applications used in "Modern Industrial Statistics: with applications in R, MINITAB and JMP" by R.S. Kenett and S. Zacks with contributions by D. Amberti, John Wiley and Sons, 2021, which is a third revised and expanded revision of "Modern Industrial Statistics: Design and Control of Quality and Reliability", R. Kenett and S. Zacks, Duxbury/Wadsworth Publishing, 1998.

Daniele Amberti

ETCHRATE: Data on the Rate of Etching

Description

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Examples