ETCHRATETWO

Rate of removal of field oxide in two different semiconductor plasma etching processes, A and B.

datasets

Provide all the data sets and statistical analysis applications used in "Modern Industrial Statistics: with applications in R, MINITAB and JMP" by R.S. Kenett and S. Zacks with contributions by D. Amberti, John Wiley and Sons, 2021, which is a third revised and expanded revision of "Modern Industrial Statistics: Design and Control of Quality and Reliability", R. Kenett and S. Zacks, Duxbury/Wadsworth Publishing, 1998.

Daniele Amberti

mistat

Data Sets, Functions and Examples from the Book: "Modern
Industrial Statistics" by Kenett, Zacks and Amberti

ETCHRATETWO function

A data frame with 12 observations on the following 2 variables.<dl>
 <dt><code>A</code></dt>
<dd>a numeric vector, rate of etching, sample A</dd> <dt><code>B</code></dt>
<dd>a numeric vector, rate of etching, sample B</dd> 
</dl>

Format

Data on the Rate of Etching (two samples) — ETCHRATETWO

A data frame with 12 observations on the following 2 variables.<dl>
 <dt><code>A</code></dt>
<dd>a numeric vector, rate of etching, sample A</dd>

 <dt><code>B</code></dt>
<dd>a numeric vector, rate of etching, sample B</dd>

 
</dl>

ETCHRATETWO: Data on the Rate of Etching (two samples)

Description

Usage

Arguments

Format

Examples